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sputtering applications

specialized applications :: ultra high vacuum
 
Ultra Clean
For applications that require an extremely high degree of cleanliness, Angstrom Sciences offers a complete selection of circular and rectangular UHV magnetrons.
 
100% Welded Construction
Available in targets up to 8" diameter, these cathodes feature 100% welded construction, with no metal or elastomer "O"-ring seals that can lead to out-gassing.
Applications :: Applications :: Specialized Applications :: Ultra High Vacuum
 
Contamination Free
Their magnetic arrays are completely de-mountable while the source and target remain in situ and under vacuum. That means contaminants won't condense on the target surface as you bake the chamber out, because you don't have to run coolant water through the source.
 
Magnetic Flexibility
This magnetron design makes an extremely flexible research tool, because the magnets can be changed quickly and easily to facilitate unbalanced sputtering or work with magnetic materials.
 
Full Compatibility
Our sources are compatible with all DC and RF power supplies, and are fitted with a wire mesh shield for safe use in RF applications.
 
Extensive Options
And, naturally, they can be provided with a complete range of options, including a variety of insertion lengths, shutters, and gas inlet rings.
 
UHV Magnetron Sizes
TARGET
DIAMETER
MINIMUM CF
FLANGE SIZE
INSERTION
LENGTHS
1"
2.75
0 - 24"
2"
4.625
0 - 24"
3"
6.00
0 - 24"
4"
8.00
0 - 18"
6"
10.00
0 - 12"
8"
13.25
0 - 12"
       
       
     
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