| The patented profiled magnet design in Angstrom Sciences' planar magnetron cathode optimizes the shape of the magnetic field, which increases thin film uniformity and improves target utilization. Now, Angstrom Sciences has developed a new magnetic retrofit to improve rotating cylindrical magnetron performance by putting a new spin on old technology. |
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| By taking advantage of its profiled magnet design, Angstrom Sciences has improved the rotating cylindrical magnetron’s performance, creating a deposition profile that is closer to normal between the source and the substrate. The improved deposition profile offers reduced debris accumulation on the chamber walls. Further to this inherent power savings, the Angstrom Sciences magnet array offers a higher magnetic field intensity, which provides the opportunity to run the sputtering process at lower power to achieve typical deposition rates. |
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| The new patent-pending technology is designed to maximize existing cylindrical magnetron performance and throughput. Customer testing verifies a power savings as high as 20% for manufacturers using this new technology. |
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| Also currently in development at Angstrom Sciences is a high power supported cantilever rotating cylindrical magnetron incorporating the same magnetic technology teamed with: |
- An optimized electrical brush design to deliver high power while avoiding arcing as well as reduced brush wear and debris.
- An NW50 type quick connect water to vacuum seal for Quick target changes, shorter down times and increased production.
- A universal and cost effective magnet design with customized turnarounds for standard, dog boned or shielded targets.
- A lightweight, easily-serviced product with many off-the-shelf components for low-cost, long-term investment and long term reliability.
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