Angstrom Sciences provides high-purity Zinc (Zn) sputtering targets and evaporation materials for all deposition applications.
Zinc Oxide Sputtering Targets
We also offers Zinc alloys and compounds including:
ZnAl
ZnCo
ZnGa
ZnIn
ZnMg
ZnO
ZnO/Al2O3
ZnS
ZnSn
Call Fritz at 1.412.469.8466 for more information about our sputtering targets or click here to request more information.
Welcome to the Angstrom Advantage™ June Newsletter
Welcome to the Angstrom Advantage™. This month, read about how our patented profiled technology and in-house capabilities can optimize your process.
Magnet Expertise
The target utilization and film uniformity of your sputtering process are largely determined by the optimization of the magnet array within your sputter source. All reputable manufacturers of magnetron sources use some form of magnet mapping technology that helps them predict target erosion patterns and coating uniformity.
Angstrom Sciences goes one step further. We customize not only the arrangement of the magnets within the array, but also the shape of the magnets. Not even the most carefully calculated placement of conventional magnets could broaden, flatten, and control the magnetic field as well as our profiled magnets.
Figure 1: Competitors' Magnets vs. Angstrom Sciences' Magnets
This approach allows us to use 2D and 3D Finite Element Analysis to match your application with the magnetic profile that will work best for you, customizing and optimizing your system’s performance.
Figure 2: 2D Magnet Map of an Unbalanced Onyx 3
Figure 3: 3D MagnetMap of an Onyx 3 - Mag I
Some manufacturers have tried to achieve similar results by installing secondary magnets to alter the shape of the magnetic field. This is not only more costly to manufacture; it tends to generate stray field lines, which will reduce uniformity in your process.
