One of the primary topics of discussion at this year’s SVC show was High Power Pulsed or High Power Impulse Magnetron Sputtering. Some of the advantages to this process include:

• Increasing the ionized sputter fraction
• Increasing film growth rate
• Achieving peak plasma power densities with the use of high-power power supplies with “on” times of 10-20ms.

Angstrom Sciences supplies HPP circular and linear magnetron sputtering cathodes. These magnetrons incorporate all aspects of The Angstrom Advantage™. For more information on how one of our HPP magnetrons can optimize your sputter process contact Tom at 1.412.469.8466 or complete our application questionnaire.

Angstrom Sciences offers a full line of Unbalanced Magnet Configurations that can be customized to meet your specific application needs. Unbalanced magnet configurations are characterized by a less-confined magnetic field, which allows the magnetic flux to extend beyond those of a balanced magnet configuration.

Electrons and ions are less tightly bound to the target region within an unbalanced configuration, and electrons in particular can readily reach the substrate. Higher electron densities heat the substrate and provide a mechanism for ionization; both of which can be important in the formation of special films.

Unbalanced Magnet Configuration can be customized to the outer or inner magnet assembly and provided at various ratios. If you have any questions on our unbalanced magnet configurations, please feel free to contact us at 1.412.469.8466 or info@angstromsciences.com.