|Mark Wilson, Vice President|
|Angstrom Sciences, Inc.
40 South Linden St.
Duquesne, PA, USA 15110
For Immediate Release
Angstrom Sciences Awarded New Patent
Pittsburgh, PA, February 15, 2001 - On January 9, 2001, the United States Patent and Trademark Office issued Patent Number 6,171,461 to Angstrom Sciences, Inc. This patent covers a number of improvements in advanced magnetron technology, including improved target and magnet cooling, an efficient direct power coupling, and a new method for injecting process gas. The patent also includes the use of removable shaped magnets that provide improved target utilization, choice of erosion pattern, and balanced or unbalanced sputtering by simple magnet substitution. Further, the patent covers the use of a threaded anode shield that significantly reduces the overall magnetron diameter and allows faster target changes.
Angstrom Sciences is the world leader in magnetron technology used to produce thin films by the "sputtering"process. Sputtering is used to manufacture advanced products, such as CDs, energy efficient architectural glass, fiber optic network components and semiconductors. The company holds patents in the use of shaped magnets and turbulent cooling water flow in magnetron designs. Angstrom magnetrons provide the unique combination of high target utilization and deposition rates with uncompromised film quality - known collectively as the “Angstrom Advantage™.” The company has a worldwide business presence and is headquartered in Pittsburgh, PA.