Magnetron Sputtering Technical References
Please Note: Angstrom Sciences has created a technical reference section to help provide detailed technical information to our visitors. We have organized the information into several categories listed below. The information has been supplied by reputable sources and is believed to be reliable and accurate and should be used as a guide only. No guarantee, warranty, or representation is made, intended, or implied as to the correctness of any of the information supplied herein.
|Generalities on Target Setup|
|"On The Fly" Cathode Uniformity Tuning|
|Advanced Reactive Sputtering Process Control Technology and Systems|
|Growth End Properties of High Index Ta2O5 Optical Coatings Prepared by HIPIMS|
|HIPIMS Discharge Optimization|
|Deposition Rate Enhancement in HIPIMS|
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