In Diode Sputtering, there is no use of magnets and thus, no magnetic field to contain the plasma. This means that plasma ions flow freely throughout the vacuum system and activate the entire surface area of the target, increasing target utilization. However, this also means that sputtered film particles are free to move throughout the chamber, not directly to the substrate. This can significantly increase your process time.
Angstrom Sciences provides diodes for all cathode sizes.
For more information regarding diode magnetrons or to discuss your project, call 412-469-8466 or contact us online.