HiPIMS – Magnetron Sputtering
Angstrom Science has developed solutions for both their circular and linear magnetron product lines that permit the magnetic field to be either varied discretely (though interchangeable magnet sets for internal mount cathodes) or continuously (through magnet pack height adjustments on external mount cathodes).
HIPIMS magnetrons are used for pretreatment of a substrate prior to coating deposition and thin film depositions with high microstructure density.
HIPIMS sputtering stands for High Power Impulse Magnetron Sputtering. This relatively recent advance in pulsed sputtering using very high power, short duration pulses of power to both generate a plasma and ionize a large percentage of the sputtered atoms.
It has been shown that precise control of the intensity of the magnetic field at the target surface is critical for the HIPIMS process for both the reduction of arcing and optimum ionization of the sputtered material.
For more information about HIPIMS Magnetrons or how Angstrom Sciences can help your business call 412-469-8466 or contact us online.