Spectroscopic Plasma Monitor Systems...........
..........Process control for industry and R&D
PLASUS is a leading manufacturer of spectroscopic plasma monitor systems. Founded 20 years ago, our core competence is the development of turn-key process control systems for industry and R&D applications. Our systems are applied for plasma monitoring, process control, process optimization, quality control and spectroscopic plasma analysis.
Benefit from our many years of experience and leading industry know-how - we will be at your service and advise you comprehensively for your application!
Angstrom Sciences’ broad experience and leading market position in planar and cylindrical magnetrons, places Angstrom at the forefront in offering the broadest industry range of performance and application specific designs in a complete package that provides a total solution for high performance reactive sputtering processes. Angstrom Sciences can also provide on-site process support and integration of the process flow systems providing our customers with both hardware and fully integrated solutions. Please contact our sales group for specific options and further details.
Broad band spectrum acquisition
The broad band spectrometer modules of the system acquire continuously complete spectra of the plasma light emission from 200 to 1100 nm.
Real time monitoring of plasma emission
Light emission from process relevant plasma particles is observed and tracked in real time. This allows a continuous monitoring of plasma conditions and changes are realized instantaneously.
Real-time monitoring gives the capability to optimize the plasma process by taking advantage of the instant system response on parameter changes.
Analog and digital outputs and inputs are available to install open and closed loop control functions. This feature can be used, for example, for end-point detection or for monitoring deviations from standard plasma process conditions. The integrated digital PID control function gives direct access to applications where closed loop control is necessary such as gas flow control or power control in reactive sputtering applications.
The EMICON MC and EMICON SA systems are available with up to 8 independent spectrometer channels. This enables e.g. multi-chamber process control or spatial resolved gas flow control in reactive sputtering applications.
Easy set-up for industrial environments
All parts of the system are designed to work in industrial conditions. The EMICON SA system for stationary production lines is managed by LAN interface. The USB 2.0 connectivity of the EMICON MC system makes this system the first choice for mobile use at different application.
Industrial interfaces PROFIBUS and LAN
All EMICON models can be extended by the industrial interfaces PROFIBUS and LAN for easy integration in industrial applications.
There are several EMICON series which satisfy different application types:
EMICON MC: multi-channel standard system for plasma monitoring and process control.
EMICON SA: stand-alone system with integrated process unit for process control in production lines.
EMICON HR: spectral high-resolution system for detailed plasma analysis and plasma monitoring.
EMICON MC / HR Brochure
EMICON SA Brochure
EMICON MC / SA / HR Data Sheets
EMICON SpecLine Brochure
Emicon SpecLine Database for A /AM/ AMS
EMICON Vacuum Optics Brochure
EMICON Vacuum Optics Data Sheet
EMICON SpecLine Software Download Trial
EMICON Application Questionnaire
EMICON Optics Setup Diagram
For more information about Plasus Reactive Gas Controls, Call 412-469-8466 or email firstname.lastname@example.org